Thin Film Analysis by X-Ray Scattering

Dr. Mario Birkholz was born 1958 in Hamburg, Germany. He studied physics at the Free University of Berlin and completed his diploma thesis on structural investigations of biological membranes in 1986, and obtained his Ph.D. on the structure of stoichiometry deviations in iron-pyrite in 1990. Research positions at Hahn-Meitner-Institut Berlin, at Fraunhofer Institute for Thin Film and Surface Technology, Braunschweig, and at IHP Microelectronics, Frankfurt (Oder), followed.
He is involved in the development of thin film systems for applications in photovoltaics, sensor technology and as protective coatings. His main scientific interest is focused on the structure and morphology of thin films, their investigation by x-ray scattering techniques and the relation between structure and function.